脉冲激光镀膜技术在氢化物薄膜制备中的应用

The Application of Pulsed Laser Deposition in Hydride Thin Film

分析了脉冲激光沉积(PLD)镀金属薄膜的性能特点。PLD镀膜技术可望实现金属氢化与氢化物一步成膜,且薄膜应力小、缺陷少、晶格尺寸大,能够消除传统方法制备的金属薄膜在氢化过程中因膨胀而引起的膜性能降低,增强薄膜与基体的粘附能力、薄膜的稳定性与固氦能力。PLD技术在氢化物薄膜研制中具有一定的技术优势,有望成为研制氢化物薄膜的重要技术手段。

The properties of metal thin films by pulsed laser deposition（PLD） are summarized, t he nyanae into fihn deposition and the metal-hydrogenation in the plume take place simultaneously via PLD is expected. Consequent- ly, the swelling of the film, caused by hydrogen-absorption of metal film, is avoided, and the mechanical properties do not decrease. Compared with traditional deposition technology, thin films by PI.D with less stress, fewer defect, lar- ger grain size and better adherence, are more stabile, and can preserve more Heliun PLD can emerge as one of the most important techniques for depositing hydride thin film.