1Coso G Del, Cafiizo C D, Luque A. Chemical Vapor Deposition Model of Polysilicon in a Trichlorosilane and Hydrogen System[ J]. Electrochem Society ,2008 ,155 (6) :485 -491.
2Habuka H, Nagoya T, Mayusumi M, et al. Model on Transport Phenomena and Epitaxial Growth of Silicon Thin Film in SiHCI3 -H2 System under Atmospheric Pressure [ J ]. Crystal Growth, 1996,169 ( 1 ) :61-72.
3Habuka H, Aoyama Y, Akiyama S, et al. Chemical Process of Silicon Epitaxial Growth in a SiHC13 -H2 System [ J ]. Crystal Growth, 1999,207 (1- 2) :77-86.
