摘要
不同的曝光方式适应不同的曝光工艺,对接触接近式曝光机的曝光方式进行了研究,分析了不同曝光方式适用的场合。并给出了一个通过改进曝光方式实现曝光工艺的成功实例,进一步证明了将产品生产工艺知识融入到半导体设备设计研发过程中的必要性。
Abstract： Different exposal mode is suitable for different exposal process, exposal modes of Mask Aligner are studied and application situation of different exposal mode l s analyzed. A sucessful example of achieving exposal process by technics improvement on exposal mode is provided, and necessity is proved that production process Knowledge of product is integrated in design and study of semiconductor equipment.
出处
《电子工业专用设备》
2012年第6期24-25,30,共3页
Equipment for Electronic Products Manufacturing
关键词
曝光机
曝光方式
曝光工艺
必要性
Mask Aligner
Exposal Mode
Exposal Process
Necessity
