Development and prospect of near-field optical measurements and characterizations

扫描近地的光显微镜学(SNOM ) 是在 nano 光的大小和描述的一个理想的试验性的测量系统。除有在衍射限制以外的分辨率的显微镜学以外，有纳米分辨率的分光镜和有新奇表演的另外的仪器为在 nano 光学和 nanophotonics 的研究是不可缺少的。这篇论文考察发展中的历史近地光(NFO ) 测量方法并且在未来预见它的前景。NFO 大小的开发通过了四个阶段，包括有超级分辨率，近地的光谱学， nanooptical 参数的大小，和近地的相互作用的察觉的光成像。为每个阶段，研究目的，工艺的性质和应用程序，领域被讨论。

Scanning near-field optical microscopy （SNOM） is an ideal experimental measuring system in nano-optical measurements and characterizations. Besides microscopy with resolution beyond the diffraction limit, spectroscope with nanometer resolution and other instruments with novel performances have been indispensable for researches in nano-optics and nanophotonics. This paper reviews the developing history of near-field optical （NFO） measuring method and foresees its prospects in future. The development of NFO measurements has gone through four stages, including optical imaging with super resolution, near-field spectroscopy, measurements ofnanooptical parameters, and detections of near-field interac- tions. For every stage, research objectives, technological properties and application fields are discussed.