纳米压印过程中的聚合物流变机理

Study on Rheological Mechanism of Polymer Used in Nano-imprint Lithography

针对紫外纳米压印工艺,采用有限元软件对光刻胶的流变填充过程进行了模拟.根据紫外压印中光刻胶黏度系数小的特点,建立了基于黏性流体的模型,采用流固耦合的ALE(ArbitraryLagrange Euler)方法,系统分析了模板的周期性、占空比、深宽比及非周期结构对光刻胶填充效果的影响.结果表明,相对于非周期模板,周期结构的模板所能引起的图形转移缺陷小;占空比及深宽比对小周期模板比大周期模板的影响大.进行了纳米压印实验,实验结果与仿真结果吻合,说明了仿真的可信,可以作为模板结构设计及表面处理工艺的依据.

The photoresist filling process was simulated by using the finite element software in the UV nano-imprint processing. According to the photoresist＇s characteristics of small coefficient, a viscous fluid model which is based on fluid--solid--interaction （FSI） method through ALE （Arbitrary Lagrange Euler） algorithm was established in this simulation. The elements which affect the photoresist filling process were analyzed systematically, such as the periodic of the template, the fill factor, the aspect ratio and the non- periodic structure template. The result shows that, comparing with the non-periodic structure template, the periodic template will bring less deficiency. The change of the fill factor and the aspect ratio at the low- er periodic template enjoys bigger effect than the larger one. The nano-imprint experiments were carried and the results match well with the simulation, which indicates the simulation＇s reliability and can be used as basis for template design and surface treatment process.