摘要
利用TaCl2-H2-HCl反应体系,采用冷壁式化学气相沉积法(CVD)在钼基体表面沉积钽涂层。通过X射线衍射仪、金像显微镜及扫描电镜等手段,对不同沉积温度下钽涂层的组成、组织及形貌进行了研究。结果表明:在1000～1300℃范围内,钽沉积层的相组成无变化,而对择优生长有一定影响;钽沉积层晶粒尺寸随沉积温度的升高而增大;钽沉积层表面颗粒呈金字塔形多面体且随沉积温度的升高而增大。
The Ta coating on the surface of Mo matrix was prepared by cold-wall CVD in TaC12-H2-HC1 system. The influences of temperature on phase composition, mierostructures and surface morphology of the coating were studied. The results showed that within 1000℃ 1300℃, with the increase of temperature, although grain size increased, there was no obvious change on the phase composition of tantalum coating; the Ta crystals were polyhedral pyramid and increased with the temperature.
出处
《稀有金属》
EI
CAS
CSCD
北大核心
2012年第4期563-567,共5页
Chinese Journal of Rare Metals
基金
国家自然科学基金资助项目(50171031)
云南省自然科学基金资助项目(2010zc251)
关键词
化学气相沉积
钽涂层
相组成
显微组织
形貌
chemical vapor deposition （CVD）
tantalum coating
phase composition
microstructures
surface morphology
