等离子体对ICP-MS调谐结果的影响

Influence of Plasma Condition on ICP-MS Tuning Result

[目的]为了提高灵敏度和减少氧化物、双电荷等的质谱干扰。[方法]分析了等离子体参数射频功率、载气流量、采样深度、雾化泵泵速对ICP-MS灵敏度、氧化物、双电荷的影响。[结果]以ICP-MS 7700x为例,给出在标准模式下各参数的最佳范围,即射频功率1400～1 500 W,采样深度7.0～8.5 mm,载气流量1.05～1.15 ml/min,雾化泵泵速0.10～0.15 r/s。[结论]该研究得到ICP-MS 7700x标准模式等离子体参数。

[Objective]The research aimed to improve the sensitivity and reduce the spectral interference of oxide and double charge,etc.[Method] The influence of plasma condition,including RF power,sample depth,carrier gas and nebulizer pump,on ICP-MS normal gas model tuning about the sensitivity and oxide ions and doubly charged ions were researched.[Result] Taking ICP-MS 7700x for example,optimum range of plasma condition was given,such as RF power 1 400-1 500 W,sample depth 7.0-8.5 mm,carrier gas 1.05-1.15 ml/min,and nebulizer pump 0.10-0.15 r/s.[Conclusion] The plasma parameter of ICP-MS 7700x was gained.