摘要
通过对络合剂、稳定剂、光亮剂的筛选 ,获得一种较理想的酸性化学镀镍工艺 ,该工艺具有沉积温度低 (70°C左右 )、镀速高 (8～ 1 0 μm/h)、镀层光亮、耐蚀性优异、镀液稳定性好、成本低等特点。
This article presents an ideal process of acidic bright electroless nickel plating, based on an investigation on complexing agents, stabilizing agents and brighteners. This process is characterized by its low temperature of reaction (around 70°C), fast velocity of deposition (8~10μm/h), bright coating, good corrosion resistance and stability.
出处
《腐蚀与防护》
CAS
2000年第4期173-175,共3页
Corrosion & Protection
关键词
化学镀
低温
络合剂
镀镍
酸性光亮镀
Electroless nickel plating Low temperature Complexing agent Bright
