期刊文献+

旋回流气爪流场特征的数值分析 被引量:1

Numerical Analysis on the Flow Characteristics of Vortex Gripper
下载PDF
导出
摘要 基于在旋回流气爪腔体内增设绕流柱的设计方案,采用数值方法分析气室内旋回流的形成、发展过程,进一步明确了气爪内部的流场特征、压力分布规律及其吸附原理。数值计算结果表明:增设绕流柱后,可改善气爪内部和被吸附工件表面的压力分布趋势,增加吸附力,提高吸附稳定性;提高供气量,会导致旋回流的流速增加,强度提高,负压程度和吸附力也相应增大。 Based on the design of adding the inner rotating cylinder in the vortex gripper, the numerical method was adopted to analyzing the formation and development process of rotating flow in the gripper, and then the flow characteristics, pressure distribution in the gripper and its adsorption theory were further clarified. The numerical results showed that: After adding the inner rotating cylinder, the pressure distribution trend in the gripper and on the surface of workpiece was improved. Besides, the adsorption force and stability were also increased; Increasing the supply amount of gas will lead to the rising of rotating flow velocity and intensity, and the value of negative pressure and adsorption force accordingly become bigger.
出处 《液压气动与密封》 2012年第7期16-19,共4页 Hydraulics Pneumatics & Seals
关键词 非接触式搬运 气爪 旋回流 吸附性能 数值分析 non-contact handling gripper rotating flow adsorption performance numerical analysis
  • 相关文献

参考文献5

  • 1阮晓东,郭丽媛,傅新,邹俊.旋涡式非接触硅片夹持装置的流动计算及试验研究[J].机械工程学报,2010,46(16):189-194. 被引量:9
  • 2叶骞,孟国香,谢文华,等.旋流式非接触吸盘:中国,200810036545.2[P].2008-09-17.
  • 3MA Wen-qi,XU Li-fang,YU He-chun. Structural Optimization of Non-contact Vortex Negative Pressure Carrier[J]. Advanced Materials Research, 2010,101.
  • 4Xin Li, Kenji Kawashima, Toshiharu Kagawa. Analysis of Vortex Levitation[J]. Experimental Thermal and Fluid Science, 2008,32.
  • 5韩占忠,王敬,兰小平.Ftuent流体工程仿真计算实例及应用[M].北京:北京理工大学出版社,2004.

二级参考文献8

  • 1Advantages and challenges associated with the introduction of 450 mm wafers(2005)[DB/CD]. ITRS Starting Materials Sub-TWG, 2005.
  • 2IZUMI A. Non-contact holder device and non-contact holding and conveying device: USA, US029051Al[P]. 2006-11-28.
  • 3VINCENT V, PIERRE L, ALAIN D. Non-contact handling in microassembly: Acoustical levitation[J]. Precision Engineering, 2005, 29: 491-505.
  • 4PARK K H, LEE S K, YI J H, et al. Contaetless magnetically levitated silicon wafer transport system[J]. Mechatronics, 1996,6(5): 591-610.
  • 5LI Xin, KAWASHIMA K, KAGAWA T. Analysis of vortex levitation[J]. Experiment Thermal and Fluid Science, 2008, 32(8): 1 448-1 454.
  • 6LI Xin, KAWASHIMA K, KAGAWA T. Dynamic characteristics of vortex levitation[C]//SICE Annual Conference 2008. Japan: The University Electro Communications, 2008:1 175-1 180.
  • 7滕燕,李小宁,赵萍萍.流量自调式射流真空发生器[J].机械工程学报,2008,44(9):241-247. 被引量:7
  • 8郭东明,康仁科,金洙吉.大尺寸硅片的高效超精密加工技术[J].世界制造技术与装备市场,2003(1):35-40. 被引量:13

共引文献8

同被引文献4

引证文献1

二级引证文献2

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部