新型抛光垫沟槽及其在化学机械抛光中的作用研究进展

Research progresses on the new groove shapes of polishing pad and their effects on CMP processes

化学机械抛光过程中,抛光垫性能是影响抛光质量和抛光效率的重要因素之一,而抛光垫的性能又受其表面沟槽结构形状的影响。在介绍几种常见抛光垫沟槽结构形状的特性及其作用研究的基础上,介绍了新型抛光垫沟槽的研究进展,总结了几种新型抛光垫沟槽对抛光效果的影响,为抛光垫沟槽特性的进一步研究提供参考。

In the process of chemical mechanical polishing（ CMP）, the performance of polishing pad is one of the most important factors that affects the quality of polished surface and polishing; efficiency, which is influenced by the surface groove shape of the pad surface. In order to provide a reference for further research on the groove performances of polishing pad, the research progress on new groove structures of polishing pad was presented, and the effects of new pad groove structures on the CMP processes were summarized.