数字微镜器件制造精度误差对紫外光调制特性的影响

Phase modulation properties of digital micromirror device in UV beam

数字微镜器件(DMD)的能量利用率对于提高无掩膜激光直写系统的效率十分重要。对DMD在相干光照明下的相位调制特性进行数值和实验分析,发现同种型号DMD在出射0级光垂直于微镜表面角度入射情况下的衍射图样,其光能量分布各不相同,有0级光强占总光强27.2%的情况,也有零0级光强占总光强13.1%的情况,理论计算表明,DMD的微镜偏转角存在±1°的误差可以使DMD衍射0级的衍射效率在极大和极小之间变化。这一结论对于选择高能量利用效率的DMD有重要参考价值。

In order to improve the optical energy utilization of the maskless lithography system based on digital micromirror device （DMD）, the phase modulation properties of DMD at UV laser illumination were investigated. The impact on the phase modulation properties caused by the processing error of DMD was analyzed. The diffraction patterns of three DMDs of the same model at the UV laser illumination were tested, and results showed that their light field distri butions were significant modulation properties. ly T different, the DMD processing error had great impact on the phase his conclusion has great reference significance for choosing DMDs with high utilization efficiency.