溅射制备薄膜过程中的光谱在线测量研究

THE ON LINE SPECTRUM MEASUREMENT IN THE PREPARATION OF THIN FILM

在制备薄膜的过程中,利用光谱分析的方法,以放电光谱特征谱线强度的变化来反映相应物质成分的变化,以连续光谱光源发出的光透射过薄膜的透射率的变化,来反映薄膜的厚度、折射率、吸收系数等光学参数的变化,从而达到在制膜过程中,对薄膜的成分、厚度等参数进行在线监控的目的.

The variation of the film composition can be monitored by using the method of spectrum analysis during the film deposition (for the intensity of the persistent line is proportional to the particle density of the element in the vacuum chamber).The measurement of the transmission spectrum of the film on a transparent substrate can be used to calculate the film parameters,such as refractive index,extinction coefficient and the thickness of the film.Therefore,the combination of the two methods would be helpful to on line monitoring the film constituents and the optical paramenters in the preparation of thin films.