期刊文献+

预电离大气压低温等离子体射流及其在表面清洗中的应用 被引量:17

Atmospheric Pressure Low Temperature Plasma Jet Assisted by the Preionization and Its Application on Surface Cleaning
下载PDF
导出
摘要 具有高化学活性的大气压放电低温等离子体射流具有潜在的应用价值。为此,介绍了一种利用预电离办法产生Ar/O2等离子体大气压低温射流及其在表面油污清洗中的应用。采用针电极放电等离子体作为预电离源,为射流介质阻挡放电(DBD)提供种子电子,使得射流DBD的击穿与维持电压得以降低,即使在氧气与氩气体积比高达6%时,也可以产生均匀稳定的放电模式。采用光纤温度传感器检测得到放电等离子体气体温度在390~440K,而Boltzmann斜率法计算得到的电子激发温度为4640K,通过示踪元素法计算得到氧原子数密度在1017 cm-3量级。将该射流应用到玻璃表面油污清洗,最大清洗速率可达0.1mm/s。所以预电离技术可以产生具有高化学活性的均匀放电的大气压低温等离子体射流,该射流在表面油污清洗中具有较高效率。 We investigated an atmospheric pressure nonequilibrium mixtures by specially designed presented its application in oil equipment with two coaxial quartz removal from material surface. By argon/oxygen plasma jet generated in Oz/Ar capillaries and double power electrodes, and taking the syringe needle plasma as its pre- ionization source to supply seed electrons for the hybrid barrier-jet discharge, uniform discharge mode with a lower breakdown voltage even when the ratio of oxygen in argon was up to 6 ~ could be generated. The Boltzmann's plot was performed by time-averaged optical emission spectroscopy to evaluate the excitation electron temperature, showing that the value is 2678 K, meanwhile, the gas temperature was from 390 K to 440 K measured by a fiber thermometer. The concentration of atomic oxygen was estimated by actinometry to be about in an order of magnitude of 10I7 cm-3. The jet was then employed to oil removal from glass surfaces and a maximum cleaning rate of 0. 1 mm/s was achieved. Results show that the preionization technology is an effective method to generate atmospheric pressure uniform discharge plasma jet with high plasma chemistry activity, and the jet can be applied to oil removal from material surface effectively.
出处 《高电压技术》 EI CAS CSCD 北大核心 2012年第7期1682-1689,共8页 High Voltage Engineering
基金 国家自然科学基金(51077008)~~
关键词 大气压低温等离子体射流 化学活性 预电离 电子数密度 氧原子数密度 表面清洗 atmospheric pressure low temperature plasma jet chemistry activity preionization electronconcentration atomic oxygen concentration surface cleaning
  • 相关文献

参考文献28

  • 1Jiang N, Ji A L, Cao Z X. Atmospheric pressure plasma jets be- yond ground electrode as charge overflow in a dielectric barrier discharge setup[J]. Journal of Applied Physics, 2010, 108(3) :033302.
  • 2Lu X P, Jiang Z H, Xiong Q, et al. An 11 em long atmospheric pressure cold plasma plume for applications of plasma medicine [J]. Applied Physics Letters, 2008,92(8):081502.
  • 3Li S Z, Huang W T, Zhang J L, et al. Discharge characteristics of an atmospheric-pressure argon plasma column generated with a single-electrode configuration[J]. Physics of Plasmas, 2009, 16(7) :073503.
  • 4Hong Y C, Uhm H S. Air plasma jet with hollow electrodes at atmospheric pressure[J]. Physics of Plasmas, 2007, 14 (5): 053503.
  • 5Koji Yamakawa, Masaru Hori, Toshio Goto, et al. Etching process of silicon dioxide with nonequilibrium atmospheric pres- sure plasma[J]. Journal of Applied Physics, 2005, 98 (1) : 013301.
  • 6Yong-Hyuk Lee, Chang-Heon Yi, Min-Jae Chung, et al. Char- acteristics of He/O2 atmospheric pressure glow discharge and its dry etching properties of organic materials [J]. Surface and Coatings Technology, 2001, 146-147(601) :474-479.
  • 7Laroussi M, Alexeff I, Richardson J P, et al. The resistive bar- rier diseharge[J]. IEEE Transactions on Plasma Science, 2002, 30(1) :158-159.
  • 8Yong Cheol Hong, Han Sup Uhm. Air plasma jet with hollow electrodes at atmospheric pressure [J]. Physics of Plasmas, 2007, 14(5) :053503.
  • 9Se-Jin Kyung, Jae-Beom Park, Yong-Hyuk Lee, et al. High- speed etching of amorphous silicon using pin-to-plate dielectric barrier[J]. Surface and Coatings Technology, 2007, 202(4/7) 1204-1207.
  • 10Koji Yamakawa, Masaru Hori, Toshio Goto, et al. Ultrahigh- speed etching of organic films using microwave-excited nonequi-librium atmospheric-pressure plasma[J]. Journal of Applied Physics, 2005, 98(4):043311.

二级参考文献27

  • 1Abdel-Aleam H Mohamed, Rolf Block, Karl H Schocnbach. Direct current glow discharge in atmospheric air [ J]. IEEE Trans Plasma Science, 2002, 30 (1) : 182-183.
  • 2F Massines, A Rabehi, P Decomps, et al. Experimental and theoretical study of a glow discharge at atmospheric pressure controlled by dielectric barrier [J]. J Appl Phys, 1998, 83(6) : 2950-2957.
  • 3E Kunhardt. Generation of large-volume, atmospheric-pressure, nonequilibrium plasmas [J] . IEEE Trans Plasma Scienee, 2000, 28(1): 189~200.
  • 4John R Roth. Industrial Plasma Engineering [ M ]. Institute of Physics Publishing, Bristol and Philadelphia, 1995, 2001. Vol. 1 and Vol. 2.
  • 5赫兹伯格.分子光谱与分子结构[M].北京:科学出版社,1983.
  • 6Eliasson B, Kogelschatz U. Nonequilibrium volume plasma chemical processing [J]. IEEE Trans. Plasma Sci., 1991, 19(6): 1063-0177.
  • 7Prinz E, Forster F, Meiners S, et al. Surface modification of polymer materials by transient gas discharges at atmospheric pressure [J]. Surface and Coatings Techn., 1998, 98(1): 1121-1127.
  • 8Yokoyama T, Kogoma M, Kanazawa S, et al. The improvement of the atmospheric-pressure glow plasma method and the deposition of organic films [J]. J. Phys. D: Appl. Phys., 1990, 23: 374-377.
  • 9Montie T C, Wintenberg K K, Roth J R, An overview of research using the one atmosphere uniform glow discharge plasma(OAUGDP) for sterilization of surface and materials [J], IEEE. Trans. Plasma Sci., 2000, 28(1): 41-50.
  • 10Roth J R. Industrial plasma engineering [M]. USA, 1995.

共引文献5

同被引文献257

引证文献17

二级引证文献66

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部