摘要
在第一代钢铁无氰镀铜工艺的基础上,开发出第二代无氰碱性镀铜新_Y-艺,成功地解决了镀液的稳定性问题。镀液的基础配方和工艺条件为:CuSO4·5H2O25.0g/L,C6H5O7K3·H2O0.2mol/L,辅助配位剂0.05mol/L,稳定剂0.2mol/L,活化剂0.02mol/L,H{BO,30g/L,KOH20g/L,添加剂10mL/L,温度45℃,pH8.8~9.2,电流密度1.0~1.5A/dm^2,阳极为电解铜。在新工艺镀液中引入一价铜稳定剂和活化离子,保证了其稳定应用。通过赫尔槽和挂镀试验研究了镀液组分和工艺条件对镀层性能和电流效率的影响,以及镀液的抗杂质能力。结果表明,在本工艺条件下,所得镀层性能良好,电流效率高于90%,镀液的抗杂质性能优良。本工艺适用于钢铁、铜合金预镀铜。经数月的连续生产,镀液保持稳定,产品结合力合格。
The second generation of novel cyanide-free alkaline copper plating process was developed based on the first generation of cyanide-free alkaline copper plating process, and the problem of bath stability was successfully resolved. The basic bath composition and operation conditions are as follows: CuSO4·5H2O 25.0 g/L, C6H5O7K3·H2O 0.2 mol/L, assistant complexing agent 0.05 mol/L, stabilizer 0.2 mol/L, activator 0.02 mol/L, H3BO3 30 g/L, KOH 20 g/L, additive 10 mL/L, temperature 45 ℃, pH 8.8-9.2, current density 1.0-1.5 A/dm^2, and electrolytic copper as anode. The addition of cuprous stabilizer and activator to plating bath ensures the stable application of the novel process. The influence of bath composition and process conditions on coating properties and current efficiency as well as the anti- impurity performance of the process were studied by Hull cell test and rack plating experiment. The coating obtained under the given process conditions has good properties, the current efficiency is above 90%, and the impurity resistance of the bath is excellent. The given process is suitable for copper pre-plating on steel and copper alloys. The bath keeps stable and the products are qualified after continuous use in production for months.
出处
《电镀与涂饰》
CAS
CSCD
北大核心
2012年第8期7-10,共4页
Electroplating & Finishing
基金
福建省经贸委企业技术创新专项资金(闽经贸计财[2011]702号)
国家自然科学基金项目(20833005
21021002
20873114)
关键词
钢铁
无氰镀铜
工艺
赫尔槽试验
应用
iron and steel
non-cyanide copper plating
process
Hull cell test
application