碳化硅光学表面数控抛光工艺参数的优化与选择

Key Factors Selection on SiC Mirror CCOS Polishing

随着空间应用技术和激光技术的迅猛发展，对光学系统提出了更高的要求；碳化硅材料以其一系列优秀的物理性质，成为一种特别具有应用前景的反射镜材料；碳化硅反射镜光学表面的光学加工研究也在国内外广泛开展。对碳化硅光学表面的抛光机理进行简要讨论；对实验方法、步骤和条件进行了介绍；定性地对碳化硅材料的抛光过程进行了讨论；通过大量的工艺实验和理论分析了对抛光盘转数、磨料粒度、抛光盘材料、抛光盘压力、抛光盘转速、抛光液酸碱度等工艺参数对碳化硅光学表面抛光效果的影响进行了讨论，并对工艺参数进行了优化和选择。

As aerospace technology and laser technology develop rapidly, higher demand for optical system is brought forward. With a number of excellent physical properties, SiC becomes a very promising material for speculums. The mechanism of polishing on SiC mirror is studied, And the key factors affecting the SiC CCOS （computer controled optic surface） polishing, such as tools, abrasives, load, speed and slurry pH are studied, chosen and Optimized.