磁控溅射沉积V-Al-N涂层的结构和性能研究

Structure and Properties of Magnetron Sputtered V-Al-N Coatings

通过反应磁控溅射法制备了V1-xAlxN(0≤x≤0.67)涂层,研究了Al含量对涂层微观结构、力学性能及摩擦磨损性能的影响。结果表明:在0≤x≤0.51范围内,随Al含量的增加,V1-xAlxN涂层的微观结构不断变得致密,硬度不断提高,其中结构最为致密的V0.49Al0.51N涂层的硬度较VN提高了近3倍;在较宽的成分区间内,V1-xAlxN涂层结构均比较致密,硬度大于30GPa,最高硬度达到41GPa;随着硬度的改善,V1-xAlxN涂层的摩擦磨损性能较VN涂层也有不同程度的提高。

V1-xAlxN（0≤x≤0.67） coatings were prepared by reactive magnetron co-sputtering. The effect of Al content on the phase, microstructure, mechanical properties and tribological behavior was studied. The result show that while a columnar structure is maitained in the V1-x Alx N（0≤x≤0.51） coatings, they are progressively densified with AlN addition. Simultaneously, the hardness is nearly quadrupled for the V0.49 A10.51 N coating showing a very dense, noncolumnar microstructure as compared with VN ; Hard（〉30 GPa） coatings can be found over a moderate range of compo sition and the microstructures, and the highest value is 41 GPa; Concomitant with the hardness improvement, the V1-x AlxNcoatings exhibites superior wear resistance to that of the VN coating.