抗蚀剂的研究进展

Research Progress on Lithographic Resists

综述了紫外光曝光的抗蚀剂、电子射线抗蚀剂、X射线抗蚀剂、电沉积抗蚀剂的组成、成像原理和分辨率,并对几种高性能抗蚀剂的原理及用于抗蚀剂的新材料做了介绍。

This review summarizes recent progress tn work on lithogramphic and electric deposition resistsexposed to various radiation sources including UV,electronic beam and X-ray radiation. New methods and materials for resists are also introduced.