摘要
采用 Xe Cl准分子激光器 (波长 3 0 8nm)照射 Al2 O3 -Si C纳米复合陶瓷试样 ,能量密度在 0 .8～ 6.0 J/ cm2 范围内。照射后 ,表面缺陷消除 ,形成连续分布的光滑平整的熔化层 ,并出现亚稳相 γ-Al2 O3 。由于表面形貌的改善和结构的变化 ,使表面韧性 K1c得到提高。
Samples of the Al_2O_3SiC nanocomposites were irradiated with XeCl excimer laser (308nm wavelength), using the energy density in the range of 08～60J/cm2. The defects were deleted and a continuous smooth melt layer on the surface was formed. And the metastable γAl_2O_3 on the surface was observed. The surface toughness K_1c was improved, because of the improvement of surface morphology and the change of surface structure.
出处
《材料科学与工程》
CSCD
2000年第2期35-37,共3页
Materials Science and Engineering
基金
国家自然科学基金!资助项目 595750 6 7
