负偏压对电弧沉积镁合金膜层结构及阻尼性能的影响

Influence of Negative Bias on Microstructures and Damping Property of Arc-Ion-Plated Mg Coating

采用电弧离子镀的方式在不锈钢基片上制备镁合金膜层。对膜层样品进行了物相分析,表面形貌观察,测定微区化学成分,储能模量和损耗模量。结果表明利用电弧离子镀的方法可以在钢基底上获得镁合金膜层。制备过程中基底偏压对膜层的表面形貌有较为明显的影响,对膜层的物相和化学成分影响不大。通过储能模量和损耗模量的测试结果得到膜层样品的阻尼性能,结果表明镁合金膜层能明显的提高基底材料的阻尼性能,同时膜层样品的阻尼能力与膜层的结构形貌有明显联系。

The Mg alloy coatings were deposited by arc ion plating on stainless steel substrate. The impacts of the coating conditions,such as the bias voltage,pressure,and argon gas flow rate,on the Mg coating were evaluated. The mi- crostmcmres and mechanical properties of Mg coatings were characterized with X-ray diffraction, energy dispersive spec- troscopy, scanning electron microscopy, and dynamic mechanical analysis. The damping capacity of the Mg coating was de- rived by evaluating the storage modulus and loss modulus. The results show that the Mg coating significantly improves the damping capacity of the substrate. We found that the negative bias strongly affects the surface morphology, but little influ- ences the phases and compositions of the Mg coating. Possible mechanism was also tentatively discussed.