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溅射氧化钛薄膜的光学性能及热处理对其结构的影响

Optical properties of titanium oxide film by magnetron sputtering and influence of heat treatment on its structure
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摘要 常温下采用反应磁控溅射法在K9双面抛光玻璃基底上沉积氧化钛薄膜,通过X射线衍射仪、光栅光谱仪和椭偏仪对氧化钛薄膜样品的光学和结构参数进行测试和分析.结果表明:溅射沉积的氧化钛纳米薄膜呈非晶态;其折射率和消光系数在可见光波段随波长的增大呈指数规律迅速变小,最终趋于一常数,氧化钛薄膜消光系数的平均值很小表明它在可见光波段是透明的;根据所得光学参数计算得到薄膜的透射率在350~800nm光波范围内,与实验测量结果吻合;沉积的氧化钛薄膜样品经过450℃保温6h的退火热处理后,由非晶态转化为晶态. Titanium oxide film was deposited at room temperature by magnetron sputtering onto 1(9 glass of which both sides were polished. X-ray diffraction, ellipsometer and grating spectrometer were employed to measure optical properties and the structure of the film, respectively. The results show that the titanium oxide film which has a nano-dimension is amorphous. Its refractive index and extinction coefficient exponentially decrease with the increase of light wavelength in visible band, and finally tend to be constants. The very small extinction coefficient indicates that the film is transparent in visible band. The theoretically calculated transmittance spectrum is consistent well with that measured one within 350--800 nm. The amorphous titanium oxide film becomes crystalline after being an- nealed at 450 ℃ for 6 hours.
出处 《天津师范大学学报(自然科学版)》 CAS 2012年第3期33-35,共3页 Journal of Tianjin Normal University:Natural Science Edition
基金 天津师范大学学术创新推进计划资助项目(52X09038)
关键词 氧化钛薄膜 磁控溅射 折射率 退火处理 titanium oxide film magnetron sputtering refractive index annealing
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