反应磁控溅射法直接制备光催化纳米TiO_2薄膜

Photocatalytic TiO_2 Thin Films Directly Prepared by Reactive Magnetron Sputtering

通过优化直流反应磁控溅射沉积工艺,在氩气和氧气气氛中溅射高纯钛靶,在玻璃和不锈钢衬底上直接低温沉积出具有锐钛矿结构的TiO2薄膜。通过X射线衍射仪(XRD)、原子力显微镜(AFM)和表面轮廓仪分析发现,当氧的体积分数在5%～20%之间变化时,制得的TiO2薄膜是致密的锐钛矿结构,具有典型的锐钛矿相(101)、(004)、(112)、(211)、(220)的晶面特征峰,薄膜的晶粒尺寸随着氧含量的增加逐渐减小,其生长速率最快可达到68nm/min。在紫外光的照射下分解甲基橙实验表明,所制备的薄膜具有良好的光催化分解有机物的能力。

TiO2 films with anatase crystal structure were directly prepared by DC reactive magnetron sputtering in an Ar/O2 gas mixture using optimizing technologic parameters.TiO2 thin films with anatase crystal structure exhibit characteristic diffraction peaks of（101）、（004）、（112）、（211） and（220） through X-ray diffraction（XRD）,atomic force microscope（AFM） and surface profilometer.The grain size of the films gradually decreases with increasing oxygen content and the maximum growth rate can be up to 68 nm/min when the concentration of oxygen was between 5% and 20%.Under UV illumination,the experiments of the decomposition of methyl orange（MO） solution show that the TiO2 films have a good property of photocatalytic decomposition of organic matters.