摘要
采用增强/耗尽型(E/D)结构的赝配高电子迁移率晶体管(PHEMT)技术,研制开发的射频开关,具有插损低、隔离度高、承受功率大、线性度高等特点。产品采用0.5μm栅长的砷化镓PHEMT E/D标准工艺加工,将开关电路和驱动电路集成在一颗芯片上,并做了相应的静电防护设计。测试结果表明,在0.01~5.0GHz带内,插入损耗≤1.2dB@3GHz、≤1.6dB@5GHz,带内输入输出驻波比≤1.5,隔离度≥60dB@3GHz、≥52dB@5GHz,1dB压缩功率点达到了30dBm,IP3超过了+52dBm。
GaAs RF switch has been designed using Enhancement/Depletion PHEMT tech- nology. This product has fealures of low loss.high isolation,high power capability,high linearity, which is produced by GaAs 0. 5 μm gate-length E/D PHEMT standard process. The switch cir- cuit and TTL driver are integrated into one chip, and an ESD-protection circuit is used to improve its ESD level. The measurement results are as follows: in 0.01-5.0 GHz frequency range, insertion loss≤l. 2 dBG3 GHz, ≤1. 6 dB@5 GHz, VSWR≤1. 5, isolation≥60 dB@3 GHz,≥52 dB@5 GHz, P-1≥30 dBm, IP3≥+52 dBm.
出处
《固体电子学研究与进展》
CAS
CSCD
北大核心
2012年第4期365-369,共5页
Research & Progress of SSE