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双层膜椭偏数据处理的新算法 被引量:4

New algorithm to the ellipsometric data inversion of double films
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摘要 为了准确测量双层透明膜,有效地结合了模拟退火法和单纯形法的优点,提出一种模拟退火-单纯形混合算法来处理双层透明膜的椭偏数据。在单波长测量时,仅测量1组椭偏参量,可以求解双层透明膜任意两个参量;测量两组以上椭偏参量,可以同时反演双层透明膜4个参量,求解薄膜折射率和厚度精度分别达到0.0002和0.07nm。结果表明,模拟退火-单纯形混合算法反演双层透明膜参量是可行和可靠的,且有较强的样品适应性。该算法适合于单波长椭偏仪对双层及多层膜的反演及实际测量。 In order to measure the optical parameters of double layer films accurately, with an effective combination of advantages of the simulated annealing algorithm and the simplex algorithm, a simulated annealing-simplex hybrid algorithm was presented to deal with the ellipsometric data inversion of double layer films. In experiments of single wavelength measurement, any two optical parameters of double layer films can be extracted with a measurement of only one group of ellipsometric parameters. Likewise, two or more groups of known ellipsometric parameters can determine four optical parameters simultaneously. And the measured accuracies of refractive index and thickness of films are 0. 0002 and 0. 07nm respectively. Results of actual measurements show that using the hybrid algorithm to obtain the optical parameters of double layer film is feasible and reliable, and has strong flexibility for various samples. The algorithm is suitable to inversion and actual measurement of double laver films and multi-laver films bv sinale wavelength ellipsometer.
出处 《激光技术》 CAS CSCD 北大核心 2012年第5期589-592,共4页 Laser Technology
基金 广东省科技计划资助项目(C60109 2006B12901020)
关键词 薄膜 椭偏数据处理 双层透明膜 模拟退火 单纯形混合算法 thin films ellipsometric data inversion double transparent films simulated annealing-simplex hybrid algorithm
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  • 1刘伟,苏小平,张树玉,郝鹏,王宏斌,刘嘉禾.制备工艺条件对HfO_2薄膜结构和性能的影响[J].真空科学与技术学报,2008,28(2):159-163. 被引量:8
  • 2陈燕平,余飞鸿.薄膜厚度和光学常数的主要测试方法[J].光学仪器,2006,28(6):84-88. 被引量:29
  • 3余平,张晋敏.椭偏仪的原理和应用[J].合肥学院学报(自然科学版),2007,17(1):87-90. 被引量:11
  • 4Ferrieu F, Dabertrand K, Lhostis S, et al. Observation of lifO2 thin films by deep UV spectroscopic ellipsometry [J]. Journal of Non-Crystalline Solids(S0022-3093), 2007, 353(5/7): 658-662.
  • 5Khos .hman Jebreel M, Kordesch Martin E. OpticaL characterization of sputtered amorphous aluminum nitride thin films by spectroscopic ellipsometry [J]. Journal of Non-Crystalline Solids(S0022-3093), 2005, 351(40/42): 3334-3340.
  • 6Hinrichs K, Roseler A, Gensch M, et al. Structure analysis of organic films by mid-infrared ellipsometry [J]. Thin Solid Films(S0040-6090), 2004, 455/456: 266-271.
  • 7Liu Y C, Hsieh J H, Tung S K. Extraction of optical constants of zinc oxide thin films by ellipsometry with various models [J]. Thin Solid Films(S0040-6090), 2006, 510(1/2): 32-38.
  • 8Tay B K, Shi X, Cheah L K, et al. Optical Properties of tetrahedral amorphous carbon films determined by spectroscopic ellipsometry [J].Thin SoHd Films(S0040-6090), 1997, 308/309: 268-272.
  • 9Bhattacharyya D, Sahoo N K, Thakur S, et al. Spectroscopic ellipsometry of TiO2 layers prepared by ion-assisted electron-beam evaporation [J]. Thin Solid Films(S0040-6090), 2000, 360(1/2): 96-102.
  • 10Venkatachalam S, Soundararajan D, Peranantham P, et al. Spectroscopic ellipsometry (SE) studies on vacuum-evaporated ZnSe thin films [J]. Materials Characterization(S1044-5803), 2007, 58(8/9): 715-720.

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  • 1冯星伟,苏毅,马宏舟,陈良尧,钱佑华.可变入射角波长扫描RPA型椭偏仪的研制[J].光学学报,1995,15(4):492-498. 被引量:4
  • 2尹鑫.45°棱镜法测量晶体折射率[J].应用激光,1995,15(3):127-128. 被引量:2
  • 3谭天亚,易葵,邵建达,范正修.利用分光光度计测量光学晶体的折射率[J].中国激光,2005,32(12):1678-1682. 被引量:10
  • 4张克奇 严义损.提高旋转检偏器式椭偏仪准确度的方法[J].光学学报,1988,8(3):228-234.
  • 5Laurent Broch, Aotmane En Naciri, Luc Johann. Systematic errors for a Mueller matrix dual rotating compensator ellipsometer [J]. Opt. Express, 2008, 16(12): 8814-8823.
  • 6R. M. A. Azzam, N. M. Bashara. Ellipsometry and Polarized Light [M]. Amsterdam: North Holland Publishing Co., 1988, 166.
  • 7Ilsin An, Jaeho Lee. A single zone azimuth calibration for rotating compensator multichannel ellipsometry [J]. Jpn. J. Appl. Phys., 2003, 42(5A): 2872-2875.
  • 8Joungchel Lee, P. I. Rovira, Ilsin An et al. Rotating-compensator multichannel ellipsometry: applications for real time Stokes vector spectroscopy of thin film growth [J]. Rev. Sci. Instrum., 1998, 69(4): 1800-1810.
  • 9Hiroyuki Fujiwara. Spectroscopic Ellipsometry Principles and Applications [M]. New York: John Wiley & Sons,Ltd., 2007. 90-91.
  • 10R. Kleim, L. Kuntzler, A. El Ghemmaz. Systematic errors in rotating-compensator ellipsometry [J]. J. Opt. Soc. Am. A, 1994, 11(9): 2550-2559.

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