TiZrV吸气剂薄膜的性能研究

Deposition and Characterization of TiZrV Getter Films

采用独立设计组装的磁控溅射装置完成了对不锈钢管道的镀TiZrV薄膜处理。对TiZrV薄膜的相关性能包括二次电子产额(SEY)、光致解吸(PSD)产额和吸气性能进行了研究。在200℃下加热2h后TiZrV的SEY有所下降,峰值由2.03降到1.55。不锈钢真空室在镀TiZrV薄膜处理后其PSD效应显著降低,在200℃下加热24h后,各气体的PSD产额与初始值相比可降低两个量级左右。TiZrV薄膜对CO和H2有较好的吸气效果,相同激活条件下对CO的抽速比H2高一个量级,吸气容量则较之低两个量级;另外,随着加热温度的提高和时间的延长,其吸气能力会有所提高。

The TiZnV getter films were deposited by magnetron sputtering,in a lab-built reactor,on the inner walls of the stainless steel pipe.The properties of the TiZrV coating,including the second electron yield,photon stimulated desorption,and gas absorption,were characterized.The results show that the TiZnV films bring about significant improvements.For instance,after being heated in situ at 200℃ for 2 h,the SEY peak decreased from 2.03 to 1.55.When it came to the residue gases,the TiZrV coating reduced the PSD nearly by two orders of magnitude after heating at 200℃ for 24 h.The TiZrV coatings most effectively absorb CO and H2.Under the given activation condition,the pumping speed for CO is one order of magnitude higher than that for H2,whereas the pumping capacity for CO is two orders of magnitude lower than that for H2.Moreover,the pumping performance of the TiZrV films can be improved by increasing the heating temperature and heating time.