诱导磁场对化学沉积Co-Ni-P薄膜磁性能的影响

Influence of Inducing Magnetic Field on Magnetic Properties of Co-Ni-P films Grown by Wet Chemical Deposition

采用化学湿法沉积技术制备了CoNiP磁性薄膜,研究了施镀过程中的诱导磁场对CoNiP薄膜磁性能和结构的影响。研究结果表明,随着施加诱导场强度的增加,CoNiP薄膜的矫顽力先增加,然后减小;当磁场强度为1300 Oe时,薄膜的矫顽力达到了751.7 Oe,比未施加磁场时提高了约28%。X射线衍射结果表明,Co-N-i P薄膜晶粒沿磁场方向生长,其c轴沿薄膜的轴向形成了很强的Co(002)织构。扫描电子显微镜表面形貌观察表明,随着磁场强度的增加,胞状颗粒逐渐增多,晶粒尺寸变小,颗粒之间结合紧密。诱导磁场对CoNiP薄膜的磁性能有良好的促进作用,这为进一步开发高性能的磁电传感器奠定了一定基础。

The Co-Ni-P films were grown by electroless wet chemical deposition in an inducing magnetic field.The impacts of the deposition conditions,such as the inducing magnetic field,concentrations of the reactants,and solution temperature,on the magnetic properties of the Co-Ni-P film were studied.The microstructures and magnetic properties were characterized with X-ray diffraction,scanning electron microscopy and conventional magnetic probes.The results show that the inducing magnetic field significantly affects the magnetic properties and microstructures of the Co-Ni-P films.For instance,as the magnetic field increased,the coercivity changed in an increase-decrease way.At 1300 Oe,the coercivity was found to be 751.7 Oe,28% higher than that of the Co-Ni-P film grown without magnetic field;and the cellular grains slowly increased,accompanied with reduction of grain size and grain boundaries.Moreover,the grains grew along the field direction,with Co（002） as the preferred growth orientation.Possible mechanism（s） responsible for the property improvement were also tentatively discussed.