摘要
利用单克隆抗体ELISA ,研究了UV_B对水稻DNA中环丁烷嘧啶二聚体 (CPD)的诱导形成及其光、暗修复 ,并对CPD累积与水稻UV_B敏感性的关系进行了分析。结果表明 ,我国南方的 5个水稻 (OryzasativaL .)品种经13.6kJ·m-2 ·d-1UV_B处理 15d后 ,在株高、生物量、光合作用等方面表现出明显的品种间差异。不同品种水稻的DNA中CPD累积比对照明显增加 ,且敏感品种CPD的累积比抗性品种显著提高。统计分析证实 ,CPD的累积与生物量的抑制呈显著正相关 (r2 =0 .6 2 2 )。UV_B诱导的水稻DNA中CPD的清除以光修复为主 ,不同品种CPD暗修复能力相似 ,而光修复能力存在明显差异。根据以上结果推测 ,不同水稻品种UV_B敏感性与CPD光修复能力的差异有关。
Five rice ( Oryza sativa L.) cultivars, widely planted in South China, were grown in greenhouse with or without supplemental UV_B radiation at level of 13.6 kJ·m -2 ·d -1 . After 15 day_UV_B treatment, significant intraspecific differences were observed in plant height, photosynthetic rate and total biomass. Based on the total biomass accumulation, cultivar “Tesanai” was found to be the most sensitive, and cultivar “Luhuangzhan” was the most tolerant species to UV_B radiation. UV_B induced cyclobutane pyrimidine dimer (CPD) in rice DNA were quantified by ELISA with specific monoclonal antibody. CPD accumulations in DNA extracted from 5 rice cultivars were remarkably increased by UV_B radiation, and it was confirmed that there was a strong positive correlation between CPD accumulation and the inhibition of total biomass. Photorepair was proved to be the predominant mode of CPD repair in UV_B irradiated rice. Light_dependent removal of CPD was very fast as compared with dark repair. Different levels of CPD accumulation among rice cultivars were related with different capacity of CPD photorepair. Capacity of light_dependent CPD removal may play an important role in UV_B resistance of rice.
基金
TheNaturalScienceFoundationofGuangdongProvince
ThebasicscientificresearchprogramoftheHigherEducationDepartmentofGuangdongPro
