光刻与微纳制造技术的研究现状及展望

Research Status and Prospect of the Lithography and Micro-Nano Manufacturing Technology

首先介绍了微纳制造的关键工艺技术——光刻技术。回顾了光刻技术的发展历程,介绍了各阶段主流光刻技术的基本原理和特点。阐述了国内外对光刻技术的研究现状,并讨论了光刻与微纳制造技术面临的挑战及其需要解决的关键性技术问题。然后重点介绍了浸没光刻、极紫外光刻、电子束光刻、离子束光刻、X射线光刻、纳米压印光刻等技术的概念、发展过程和特点,并对不同光刻技术的优缺点和生产适用条件进行了比较。最后结合国内外生产商、工程师和研究学者的研究成果,对光刻技术的未来发展做出展望。

As the key technology of the micro manufacture,the lithography technology is introduced firstly.The development history of the lithography technology is reviewed,and the principles and characteristics of the main lithography technology at each stage are described.The research status of the lithography technology are given at home and abroad,and the challenges and key technical problems of the lithography and micro-nano manufacturing technology are discussed.Then the concepts,development processes and characteristics of the immersion lithography,extreme ultraviolet lithography,electron beam lithography,ion beam lithography,X-ray lithography and nanoimprint lithography technology are introduced.The advantages,disadvantages and applicable conditions of the various lithography technologies are compared.At last,combined with the research results of the manufacturers,engineers and research scholars at home and abroad,the future development of the lithography technology is forecasted.