掺氮类金刚石薄膜的微观结构和光学特性研究

Microstucture and optical properties of the nitrogen-doped DLC film

采用射频等离子增强化学气相沉积法(PECVD)制备掺氮类金刚石薄膜(DLC:N),通过原子力显微镜,拉曼光谱和椭圆偏振光谱等对试验样品进行研究,实验结果表明,在薄膜中,氮元素主要以C=N键的形式存在,起到了降低薄膜内应力,提高薄膜附着力的作用;此外,通过控制掺氮量可以制得折射率在1.85～1.6范围内的DLC薄膜。

In this paper,nitrogen-doped DLC film （DLC：N film） was grown by RF plasma enhanced chemical vapor deposition（PECVD）, and studied with the help of atomic force microscope （AFM）, Raman and spectroscopic ellipsometry （SE）. The experimental results show that in the film, the nitrogen is in the form of C=N bond, which decreases the inner stress and enhance the adhesion force of the film, besides we find that the refractive index of DLC film ranges from 1.85 to 1.6 by controlling the nitrogen doping content.