期刊文献+

Er_2O_3阻氚涂层的化学溶液法制备研究

Preparation of Er_2O_3 tritium permeation barrier coatings through chemical solution deposition
下载PDF
导出
摘要 由于具有高的绝缘性和热力学稳定性,近年来氧化铒(Er2O3)作为一种新型的阻氚渗透涂层材料受到极大的研究重视。本文采用化学溶液法在316L不锈钢基体上制备了Er2O3阻氚涂层,研究了前躯体液pH值、浓度和晶化处理气氛对涂层结构和性能的影响。结果表明,前躯体液在pH值为7.6-7.8、浓度为0.4 mol/L进行涂覆并在空气气氛中进行晶化处理,可获得表面连续、致密的Er2O3阻氚涂层,涂层与基体的结合力达到7.8 N,涂层绝缘电阻率为106Ω.m-109Ω.m,绝缘性能、抗热冲击性能良好。 Recently, Er203 tritium permeation barrier (TPB) coatings attracted much attention due to their good electrical insulation and thermodynamic stability. In the present work, Er:O3 TPB coatings were prepared on 316L stainless steel substrates through a chemical solution deposition method. Effects of the pH value and concentration of the precursor solution as well as the crystallization atmosphere on the coating structure and properties were studied. The results revealed that continuous and dense Er2O3 coatings can be deposited with a pH value between 7.6-7.8 and a precursor concentration of 0.4mol/L, followed by an air annealing for crystallization. The bonding strength between the coatings and substrates reached 7.8N. The electrical resistivity of the coatings measured between 10^-6Ω·m~10^-9Ω·m. The coatings also had a high thermal shock resistance.
出处 《真空》 CAS 2012年第5期53-56,共4页 Vacuum
基金 科技部ITER计划专项2009年度国内配套研究课题<阻氚渗透涂层技术研究>[2009GB109005]资助
关键词 化学溶液法 Er2O3 阻氚涂层 chemical solution deposition Er203 tritium permeation barrier
  • 相关文献

参考文献10

  • 1陈辉,杨君友,朱文,肖承京,张建生,严有为.氧化铒涂层制备技术的研究进展[J].材料导报(纳米与新材料专辑),2009,23(1):313-315. 被引量:2
  • 2Singh M, Shripathi T, Shalini K, et al. Low pressure MOCVD of Er203 and Gd203 [J]. Mater. Chem, Phys., 2007, 433:83105.
  • 3Miritelloa M, LoSavioa R, Iacona F et al The influence of substrate on the properities of Er203 films grown by magnetron sputtering [J]. J.Nucl. Mater., 2007, 367: 1033.
  • 4Pint B A, Moser J L, JankowskiA et oi. Compatibility of multi-layer, electrically insulating coatings for vanadium- lithium blankets[J]. J.Nuel. Mater., 2007,367:1165.
  • 5方泽波,谭永胜,朱燕艳,陈圣,蒋最敏.非晶Er2O3高k栅介质薄膜的制备及结构特性研究[J].无机材料学报,2008,23(2):357-360. 被引量:7
  • 6A1-Kuhaili M F, Durrani S M A. Optical properties of erbium oxide thin films deposited by electron beam evaporation[J]. Thin Solid Films, 2007, 515: 2885.
  • 7Yao Z Y, Suzuki A, Muroga T et al.. Chemical formation of erbium oxide layer on V-4Cr-4Ti during exposure to liquid lithium doped with erbium[J]. J.Nucl. Mater., 2004, 329:1414.
  • 8Levchuk D, Levchuk S, Maier H etal.. Erbium oxide as a new promising tritium permeation barrier [J]. J.Nucle. Mater.. 2007.367 : 1033.
  • 9Sawada A, Suzuki A, Maier Het al. Fabrication of yttrium oxide and erbium oxide coatings by PVD methods [J]. Fusion Eng. De., 2005,75:737.
  • 10Smith D L et al. Development of coatings for fusion power applications[J]. J.Nucl. Mater., 2002,307 : 1314.

二级参考文献22

  • 1李驰平,王波,宋雪梅,严辉.新一代栅介质材料——高K材料[J].材料导报,2006,20(2):17-20. 被引量:4
  • 2Singh M P, Thakur C S, Shalini K, et al. Appl. Phys. Lett., 2003, 83 (14): 2889-2891.
  • 3Mikhelashvili V, Eisenstein G, Edelmann F. Appl. Phys. Lett., 2002, 80 (12): 2156-2158.
  • 4Mikhelashvili V, Eisenstein G, Edelmann F. J. Appl. Phys.,2001,90(10):5447-5449.
  • 5Mikhelashvili V, Eisenstein G, Edelmann F, et al. J. Appl. Phys., 2004, 95 (2): 613-620.
  • 6Chen S, Zhu YY, et al. Appl. Phys. Lett., 2006, 88 (22): 222902-1-3.
  • 7Xu R, Zhu Y Y, Chen S, et al. J. Cryst. Growth, 2005, 277 (1-4): 496-501.
  • 8Muller D A, Sorsch T, Moccio S, et al. Nature, 1999, 399 (6738): 758-761.
  • 9Dimoulas A, Vellianitis G, Travlos A, et al. J. Appl. Phys., 2002,92(1):426- 431.
  • 10He G, Liu M, Zhu L Q, et al. Surface Science, 2005, 576 (1-3): 67-75.

共引文献7

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部