工艺参数对磁力搅拌-化学沉积Ni-P-SiC镀层的影响

Effect of plating parameters on Ni-P-SiC layers prepared by magnetic stirring-electroless plating method

用磁力搅拌-化学沉积的方法,在45钢表面沉积Ni-P-SiC镀层。研究了SiC微粒添加量、搅拌速率以及镀液温度等对镀层硬度和表面形貌的影响,借助扫描电子显微镜(SEM)对镀层进行观察。结果表明:当SiC的质量浓度为10 g/L时,镀层显微硬度最大(615.2HV);当磁力搅拌速率为300 r/min时,镀层的显微硬度最大(632.8HV)。磁力搅拌-化学沉积Ni-P-SiC镀层的最佳工艺参数为:SiC添加的质量浓度10 g/L,搅拌速率300 r/min,温度85℃。

Ni- P- SiC layers were prepared by magnetic stirring- electroless plating method on 45 steel. The effect of SiC concentration, stirring rate and temperature on the microhardness of the layers was investigated. And the morphologies of Ni-P- SiC layers were observed using scanning electron microscope （SEM）. The results show that the maximum microhardness of Ni-P- SiC layers is 615.2HV, when the SiC concentration is 10 g/L, and that is 632.8HV, when the stirring rate is 300 r/min. The optimal parameters for preparing Ni-P-SiC layers are listed as follows： the SiC concentration 10 g/L, the stirring rate 300 r/min, and the temperature of plating liquid 85 ℃.