摘要
分别通过N-(p-羟基苯基)甲基丙烯酰胺与N-苯基马来酰亚胺、N-苯基甲基丙烯酰胺与N-(p-羟基苯基)马来酰亚胺的共聚合,制备了两种聚合物树脂聚N-(p-羟基苯基)甲基丙烯酰胺共N-苯基马来酰亚胺(poly(HPMA-co-PMI))和聚N-苯基甲基丙烯酰胺共N-(p-羟基苯基)马来酰亚胺(poly(MPA-co-HPMI)).结果表明,这两种聚合物都是按1∶1的摩尔比交替共聚的,它们都具有良好的溶解性、成膜性和亲水性,并且它们的玻璃化温度Tg都在280℃以上.将它们分别与感光剂2,1,5-磺酰氯的衍生物、助剂二苯甲酮等复配成两种紫外正型光刻胶,初步光刻实验表明,其最大分辨率都可以达到1μm,并且都可以耐270℃的高温.
Two copolymers poly （ （N- （p-hydroxyphenyl）methacrylamide）-co-（N-phenylmaleimide）） poly（HPMI-co-PMA） and poly （ （N phenylmethacrylamide）-co-（N~ （p-hydroxyphenyl） maleimide） ） poly （PMAco-HPMI） were prepared from the copolymerizations of N-（p-hydroxyphenyl） methacrylamide and N-phenylmaleimide, and N-phenylmethacrylamide and N-（p-hydroxyphenyl） maleimide, respectively. It showed that both copolymers were 1 ~ 1 in molar composition and were alternating. Both had good solubility in organic solvent, film-forming characteristics, hydrophilicity, and high glass transition temperature （T〉280℃）. As matrix resins, they were mixed respectively with photosensitizer derivative of 2, 1, 5-diazonaphthoquinone sutfochloride （DNS）, additive benzophenone, etc. to obtain two UV positive photoresist. Preliminary photolithographic experiments testified that both photoresists had a resolution of no less than 1 μm and a high- thermostability of up to 270℃.
出处
《影像科学与光化学》
CAS
CSCD
北大核心
2012年第5期330-337,共8页
Imaging Science and Photochemistry
基金
国家自然科学基金面上项目(51172081)
