缺陷模带隙一维光子晶体的简捷制备

Fabrication of one-dimensional photonic crystal with defect mode band gap

提出一种制备具有缺陷模带隙光子晶体实验技术思路.采用激光全息光刻方法,以夹角不同两束干光对感光物质进行两次光刻曝光,在曝光重叠区域可获具有缺陷模带隙一维光子晶体.调节入射光角度可改变缺陷模位置.研究供了简捷制作缺陷模带隙光子晶体一种实验技术思路,对缺陷模低阈值激射具有应用研究价值.

We proposed an experimental method to fabricate defect mode photonic crystal in this paper. By employing double exposure with two coherent beams interfering on the photoresist, we obtained one dimensional defect mode photonic crystal at the overlapped areas using holographic lithography. The position of the defect mode band gap can be changed by varying the incident beams angle. This study provides a novel method to fabricate defect mode photonic crystals and paves the way for further research in low-threshold lasing field.