电磁屏蔽膜国家标准介绍——《电磁屏蔽膜 化学镀铜溶液 镍离子和铜离子含量测定方法》和《光学功能薄膜 等离子电视用电磁波屏蔽膜屏蔽效能测定方法》

Introduction of national standards for electromagnetic interference shielding film “Electromagnetic Interference Shielding Film-Electroless Copper Plating Solution-Method of Determining Concentration of Ni^(2+) and Cu^(2+)” and “Optical Functional Films

随着日常生活、工作环境中电器设施的日益增多,人们意识到电磁辐射的危害性,电磁波屏蔽膜因此得到越来越广泛的应用。本文就2项电磁波屏蔽膜方面的国家标准,对电磁屏蔽膜制备所需化学镀铜溶液中镍离子、铜离子含量测定方法及等离子电视用电磁屏蔽膜的屏蔽效能测定方法制定二方面内容进行了推介。

With the increasing of electrical facilities in our life, people begin to realize the harm of electromagnetic radiation. Therefore electromagnetic interference shielding materials are widely used. Two national standards about electromagnetic interference shielding film, one of which specifies a method of determining the concentration of Ni2＋ and Cu2＋ in the electroless cop- per plating solution for preparation of electromagnetic interference shielding film, and another specifies a method of determining shielding effectiveness of electromagnetic interference shielding film for plasma TV were intruduced.