摘要
主要对 0 5 μm分步光刻机的几个代表性参数即 :投影镜头分辨率、照明均匀性、套刻精度、工作台步进精度、镜头畸变等引起误差的原因 ,测量和计算方法以及采取的相应措施作了一些归纳性总结 ,在解释问题的同时 ,也提出了相应的解决办法 ,为下一代光刻机的研制打下一定的基础。
This paper primarily summarizns the reasons of errors caused by several typical parameters of 0 5μm stepper,such as resolution of the projection lens,illumination uniformity,Overlay,the stepping precision of the wafer stage and lens distortion,and also summarizes measurement and algorithm as well as the corresponding measures to be taken.Supposing the corresponding solution while explain the problems.Thus laying a certain foundation for the development of next generation lithography system.
出处
《电子工业专用设备》
2000年第2期10-14,共5页
Equipment for Electronic Products Manufacturing
关键词
分步光刻机
参数测量
分辨率
照明均匀性
mStepper
Parameters measurement
Resolution
Illumination uniformity
Overlay
Stepping precision
