摘要
针对光刻对准系统的微纳级对位精度,本文提出一种在图像相关识别的理论分析基础上,利用纯相位匹配滤波算法以及它所特有的相干峰高度旋转敏感特性而进行投影式光刻对准的新型套刻技术。该技术可求得在套刻过程中,掩模板和硅片基板对准标记的相对平移坐标与旋转坐标的量化驱动值,其对位精度与对位效率显著提高。通过实验数据证明了该理论的实验可靠性与有效性。
A pattern recognition named phase-only matched filtering is presented to realize high precision alignment in projecting lithography.The method achieves the alignment with the characteristic direction of templates and silicon substrate using the coherent peak rotating sensitive feature in the filter,meanwhile the relative translation distance of templates and silicon substrate is obtained in recognition algorithms.Such an alignment system is assembled in our mature projection lithography machine,and we got the experimental data to prove the higher accuracy and efficiency compared with conventional algorithms.
出处
《光电工程》
CAS
CSCD
北大核心
2012年第10期54-58,共5页
Opto-Electronic Engineering
基金
国家自然科学基金资助(61107029
60977029)
广东省创新实验资助项目(HSZJ2011089)
关键词
光刻
套刻对位
模式识别
纯相位匹配滤波器
lithography
alignment technology
pattern recognition
phase-only matched filtering
