气相法生长金刚石薄膜过程和热解 CVD 实验

Growth of Diamond Thin Films by Gas Phase and Experaments by Thermal CVD

本文简述了气相法生长金刚石薄膜的基本过程,论述了反应气体系统及碳源浓度、激活源、基片温度和预处理等参数对金刚石结构和性能的重要影响.

This paper reports the fundamental process of the diamond thinfilms synthesized by gas phase.It deals with the significant influences of thereactive gas systems,carbon concentrations,activated sources,substratetemperatures and pre-treatment on the properties and structures of the films.