期刊文献+

光刻机工件台控制系统设计 被引量:5

The Design of Control System in Lithography Wafer Stage
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摘要 本文针对光刻机工件台技术中所要求的指标,建立了系统的电机模型,设计出终端控制系统,采用三环控制策略,并进行了宏动跟微动的控制策略仿真,并且分析了控制系统的误差,在实际应用中取得了很好的效果。 To satisfy the requirements of control system in space optical communication, a motor model of the system is established, a control system with three-levels strategy is proposed in this paper. The macro and micro control strategy simuliation is proceeded, Error of the control system is analyzed. The proposed is approach is proved to be reasonable in the application.
出处 《自动化技术与应用》 2012年第10期25-30,共6页 Techniques of Automation and Applications
基金 国家自然科学基金(编号61174037)
关键词 光刻机工件台 误差分析 状态反馈 lithography wafer stage error analysis state feedback
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