射流等离子体工艺参数对物理抛光效果的影响

Effect of the Atmospheric Jet Plasma Process Parameters on Physical Polishing

为实现超光滑表面光学元件的高精度无损加工,将大气射流等离子体炬技术引入到超光滑光学元件加工中.以石英玻璃为加工对象,对大气射流等离子体炬的物理抛光去除效应进行了研究,分析了大气射流等离子体炬放电功率、抛光时间、样品处理位置等工艺参数的变化,对石英玻璃刻蚀速率和表面粗糙度的影响.实验结果表明,以空气为工作气体时,对石英玻璃的刻蚀速率最高可达4.6nm/min.经抛光处理后的石英表面粗糙度受到工艺条件的影响,在等离子炬功率为420～460W,作用距离16～22mm范围内,石英玻璃的表面粗糙度有明显下降,随着抛光时间的增加,呈现出收敛性.

For the realization of the super smooth external optical elements with high accuracy and non -destructive processing, the atmospheric jet plasma torch technology was introduced. The effect of the atmospheric jet plasma torch physical polishing on materiel removal for quartz glass was studied, focusing on the process parameters, such as the jet plasma power, the polishing time and the disposing location of the sample, and the etching rate and the surface roughness as well. The experiment shows that the etching rate of quartz glass is as high as 4.6 nm/min with air as the work gas. At the same time, after polishing quartz surface roughness decreases obviously, while the ion torch power is 420- 460 W, distance range is 16~22 mm. The quartz glass surface roughness shows a convergent trend with the increase of polishing time.