期刊文献+

电阻阵列红外景物产生器微桥结构的研制及仿真 被引量:2

Fabrication and Analysis of Micro-bridge Structure for Resistor Array Infrared Scene Projector
下载PDF
导出
摘要 为了进一步提高电阻阵列红外景物产生器的性能,设计并制作了该器件的微桥结构.利用SiOx与TiWN分别作为微桥结构的介电材料与电阻材料;利用表面工艺技术制作160×120阵列微桥结构;并对微桥结构进行了热学性能的仿真分析.研究结果表明:所设计的工艺流程可行,成功制作了微桥结构阵列;制作的微桥桥面具有良好的温度分布均匀性;在相同电功率下,采用低热导率的SiOx薄膜取代SiNx薄膜能够显著提高桥面温度. In order to further improve the performance of the resistor array infrared scene projector, the micro-bridge structure was designed and fabricated. The dielectric material of SiOx and resistance material of TiWN were applied in the micro-bridge. Two-level 160 × 120 array of micro-bridge was fabricated by using surface micromachining. In addition, the finite element method was used to analyze the thermal properties of micro-bridge. The results show that the design of the process is feasible and the array of micro-bridges was fabricated successfully. The temperature distributing analysis indicates a good uniformity on the surface of micro-bridge. Moreover, the temperature of surface is increased remarkably when the SiNx film in the micro- bridge is replaced with SiOx films of low thermal conductivity.
出处 《西安工业大学学报》 CAS 2012年第8期613-616,共4页 Journal of Xi’an Technological University
基金 陕西省教育厅专项科研计划项目(2010JK590) 陕西省重点实验室开放基金项目(ZSKJ200904) 西安工业大学"薄膜技术与光学检测"科研创新团队建设计划资助
关键词 红外景物产生器 微桥 微加工技术 SIOX TiWN infrared scene projector micro-bridge micromachining technology SiOx TiWN
  • 相关文献

参考文献8

  • 1BUFORD Jr J A, JOLLY A, CMOBLEY S t Advancements in HWIL Simulation at the US Army Aviation Missile Command[C]//Proceedings of the 1999 Technologies for Synthetic Environments. Hardware- in- the - Loop Testing IV. Orlando: Proceedings of SPIE, 1999 : 23.
  • 2DRIGGERS R G,BARMARD K J,BURROUGHS Jr E E, et al. Review of Infrared Scene Projector Technology[J]. Optical Engineering, 1994,33 : 2408.
  • 3BRYANT P, SOLOMON S. Infrared Scene Projection: Virtual Reality for IR Sensor Testing [J]. Photonics Spectra, 2007,41(4) : 58.
  • 4高教波,王军,骆延令,胡煜,王吉龙,高飞,郑雅卫.动态红外场景投射器研究新进展[J].红外与激光工程,2008,37(S2):351-354. 被引量:9
  • 5李守荣,梁平治,屈新萍.红外微辐射元的研制[J].红外与毫米波学报,2003,22(4):277-280. 被引量:7
  • 6金娜,刘卫国.用于动态红外景物模拟器的超薄氮化钛薄膜[J].激光与红外,2005,35(1):35-38. 被引量:1
  • 7COLE B, WEERERS S, HIGASHI R, et al. Honey- well Resistor Array Development and Future Direc- tions[-C]//Proceeding of the 1999 Technologies for Synthetic Environments: Hardware- in- the- Loop Testing IV. Orlando: SPIE, 1999 : 188.
  • 8Honeywell Incorporation. Low Power Infrared Scene Projector Array and Method of Manufacture. United States, 5600148[-P/OL3. 1994-12- 30 [- 1997 -02- 043. http://patft, uspto, gov/netacgi/nph-- Parser? Sect1 PTO1 Sect2 HITOFFd PALLp 1 u 2Fnetahtml 2FPTO% 2Fsrchnum. htm-r llf GI ---- 50-sl 5600148. PN. OS PN/ 5600148RS PN/5600148.

二级参考文献12

  • 1吴勇勋,林怡欣,陆延青,任洪文,范筠馨,Janet R.Wu,吴诗聪,张卫东.基于切变聚合物网络液晶的亚毫秒级可调光学衰减器[J].现代显示,2006(3):27-32. 被引量:3
  • 2[1]Beasley D B, Saylor D A. Application of multiple IR projector technologies for AMCOM HWIL simulations. SPIE, 1999, 3967: 223-230
  • 3[2]Daehler M. Infrared display array. SPIE, 1987, 765: 94-101
  • 4[3]Lake S P, Pritchard A P, Sturland I M, et al. Description and performance of an electrically heated pixel IR scene generator. SPIE, 1991, 1486: 286-293
  • 5[5]Ravindra N M, Abedrabbo S, Wei C, et al. Temperature-dependent emissivity of silicon-related materials and structures. IEEE Trans. Semicon. Manufacturing, 1998, 11(1): 30-38
  • 6Capper P,Elliott C T. Infrared Detectors and Emitters: Materials and Devices [ M ]. Boston: Kluwer Academic Publishers, 2000.
  • 7Driggers R G,Burroughs E E, Williams O. Review of infrared scene project technology [ J ]. Optical Engineering, 1994,33(7) :2408 -2418.
  • 8Cole B E, Han C J. Low power infrared scene projector array and method of manufacture [ P]. US Pat 5600148,1994
  • 9Eriksson P,Andersson J Y,Stemme G. Thermal characterization of surface-micromachined silicon nitride membranes for thermal IR detectors [ J ]. J. Microelectronic System, 1997,6( 1 ) :55-61.
  • 10Wittmer M. Porperties and microelectronic application of thin films of refractory metal nitrides [ J ]. J. Vac. Sci. Technol. , 1985, A3 (4): 1797-1783.

共引文献14

同被引文献15

引证文献2

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部