摘要
本文叙述了在微米圆形电子束曝光机的图形发生器中,主扫描部分的几个关键技术问题的解决,以及所达到的指标,满足了整机对其精度高、速度快、稳定可靠的要求。
In this paper,the solution of some key-technical problems in the patterngenerator,which is applied to a micron circular electron-beam exposure mach-ine,and their targets,which have been met,are described.The requirementsof high accuracy,high speed,stable performance and reliable performance forthe machine are met.
出处
《电工电能新技术》
CSCD
北大核心
1990年第2期37-41,共5页
Advanced Technology of Electrical Engineering and Energy
