指甲花染料染真丝织物及其抗紫外线性能研究

Dyeing of real silk fabrics by Henna and its UV resistance property

采用直接水煮法对指甲花中的色素进行提取,测定了提取液的可见光吸收光谱曲线,并将该天然提取液应用于真丝织物的染色。研究了染色温度、染色时间和染液pH值对织物K/S值的影响,并采用硫酸亚铁作为媒染剂,测定了不同媒染方法的K/S值和水洗牢度。结果表明:用指甲花染液染色最佳条件为pH值为4、温度80℃、染色时间60 min;后媒染法得色最深且水洗牢度较好,并发现染色后织物具有较好的抗紫外线性能。

This paper extracts the pigment in Henna by using direct boiling method, determines visible light absorption spectral curve of the extracting solution and applies this natural extracting solution into dyeing of real silk fabrics; studies the influences of dyeing temperature, time and pH value on K/S value of fabrics and uses ferrous sulfate as mordant to measure the K/S value and washing fastness of different mordanting methods. The result shows that the best conditions for dyeing with Henna dye solution are pH 4, temperature 80 ~C and dyeing time 60 min; post-mordant dyeing method can result in the deepest color and a good washing fastness. It is also found that fabrics after dyeing have a better UV resistance property.