摘要
衬底沉积温度是影响薄膜生长形态的关键因素。针对超高真空薄膜生长中对衬底沉积温度恒温控制需求,文中讨论了基于电阻加热和液氦制冷相结合的温控系统,详细论述了LabVIEW环境下的温控系统应用软件设计思路,该应用软件通过VISA接口与精密温度控制仪进行数据通信,依据其内置的PID控制算法,实现温度控制。测试试验表明:该系统具体良好的恒温效果,能够满足超过超高真空薄膜生长时对衬底沉积温度的温控要求,具有很高的实用价值。
The substrate deposition temperature is a key factor affecting the thin film growth morphology. Based on the temperature control requirement in ultra-high vacuum thin film growth process,A temperature control system combining resistive heating up and liquid helium cooling down mechanism is discussed in the paper,the software design strategy of which is mainly considered,and the software can construct data communication with a temperature controller through the VISA interface,the accurate control of temperature can be a- chieved using the controller built -in PID algorithm. It is shown that the system has a well performance of constant temperature,which can meet the need of substrate deposition temperature control requirement for ultra-high vacuum thin film growth.
出处
《仪表技术与传感器》
CSCD
北大核心
2012年第9期13-14,42,共3页
Instrument Technique and Sensor
基金
国家自然科学基金青年基金(11104354)
青岛市科技发展计划项目(12-1-4-7-(5)-jch)
关键词
温控系统
LABVIEW
串行通信
temperature control system
LabVIEW
serial communication
