氮流量对ZnO:N薄膜微结构及光学性能影响

Effects of Nitrogen Flow on the Micro-Structure and Optical Properties of ZnO:N Films

运用射频磁控溅射技术,改变氩、氮流量比(9/1～9/4)在玻璃衬底上获得ZnO∶N样品,采用XRD、紫外-可见分光光度计、傅里叶红外光谱仪及SEM对薄膜微结构和光学性能表征。结果发现∶N流量小,样品XRD峰强小,峰位不明显,紫外可见光光谱在320～780 nm波长区间透射率变化小;随着N流量的增加,样品XRD有(002)强单峰出现,在400 nm波长以下透射率急剧下降;当氩氮流量达到9/4,样品XRD出现双峰,紫外光透射率无明显变化。

Using the radio frequency reactive magnetron sputtering technique,ZnO：N thin films were fabricated on glass substrate by changing the Ar/N2 flow ratio from 9/1 to 9/4.The samples were characterizated on the film microstructure and optical properties by XRD,UV-visible spectrophotometer,Fourier transform infrared spectroscopy and SEM.The XRD results showed that no significant peaks appeared at less N flow and the light transmission rate of UV-Vis had Small fluctuations between 320-780 nm wavelength;As N flow increasing,there was only（002） single peak in curves of XRD,transmittance of UV had a sharp decline below the 400 nm wavelength;when argon-nitrogen flow ratio increased to 9/4,curves of XRD showed two peaks near 34° of 2θ,no significant changes occurred in UV transmittance.