nc-Si/SiO_2多层薄膜的三阶非线性光学性质

Third-order Optical Nonlinearity of nc-Si/SiO_2 Thin F ilms

用简并四波混频技术研究了 nc- Si/Si O2 多层薄膜的三阶非线性光学性质 ,观察到了位相共轭信号 ,测得实验用样品在光波波长为 5 89nm处的三阶非线性极化率χ( 3) 为 4.1× 10 - 7esu,并对该材料的光学非线性产生机理作了探讨。

We have investigated the third-order nonlinear optical properties of nc-Si/SiO 2 thin films using degenerate four-wave mixing.The phase conjugation signal was observed,and the measured χ (3) at 589 nm was 4.7×10 -7 esu.The n onlinear machanism of the material was discussed. -