走向工业应用的离子辅助光学镀膜技术

Plasma Assisted Optical Deposition Technology For Industrial Applications

介绍一种新型等离子体辅助镀膜技术 ,使用该技术可使高质量的光学镀膜大量生产。该技术核心是无栅等离子体源 (GIS)。GIS可以产生大面积的均匀等离子体 ,直径大于 1 0 0 0mm。等离子体离子流强度高达 0 .5mA/cm2 ,离子流能量 2 0 - 2 0 0eV ,并能激活反应气体O2 及蒸发原子 ,用GIS进行的等离子体离子辅助镀膜这一技术 ,现正用于生产高质量的光学薄膜。

A new plasma assisted technoology is introduced.Using this technique it is possible to produce optical film of high quality in volume production.The key to the technology is the gridless plasma source(GIS).GIS can produce uniform plasma in large area,more than 1mdiameter,plasma ion current density is up to 0.5mA/cm 2 and ion energy is 20～200eV.It can excite reactive gas O 2 and vaporized atoms.Nowadays the plasma assisted deposition technology is being used to produce high quality optical films.