摘要
近年 ,硅基低维材料物理与工艺的研究预示 ,硅基光电子学将是今后半导体光电子学的一个主要发展方向 ,而对硅基纳米材料的研究一直是本领域的一个研究热点 ,评述了近年硅基纳米材料在制备技术方面所取得的新进展 ,并展望了今后的发展方向。
In the recent years,the study of Si?based low?dimentional physics and technology indicates that Si?based optoelectronics will be one of the main topics in the semiconductor optoelectronics research area in the near future.The research on Si?based nanostructure materials has been being the hot subject in the area.The new progress on fabrication technology of si?based nonostructure materials and it's future development are reviewed.
出处
《微细加工技术》
EI
2000年第3期6-11,共6页
Microfabrication Technology
关键词
硅基纳米材料
制备技术
可见光发射
Si-based nanostructure material
fabrication technology
light emission
