二氧化锆薄膜的AFM研究

AFM Study of Zirconia Films

本文采用溶胶-凝胶工艺在玻璃基体表面制备了一、二、三层ZrO2薄膜。X射线衍射(XRD)分析表明,经500℃烧结热处理后ZrO2的晶体结构为单斜相和四方相的混合相。通过原子力显微镜(AFM)对ZrO2薄膜的厚度和表面形貌进行研究表明,一、二、三层ZrO2薄膜的厚度分别约为50nm、80nm和100nm;并且,随着薄膜厚度的增加,ZrO2薄膜表面由多孔结构变为紧密、均匀分布的颗粒状结构,薄膜的表面粗糙度也逐渐减小。

Zirconia films with one, two and three layers are prepared on glass surface using the sol-gel technique. The X - ray diffractometer （ XRD ） analyses indicate that after sinterin8 at 500℃, the crystal structure of Zirconia consist of monoclinic and tetragonal phase. The atomic force microscope （ AFM ） was employed to examine the thickness and surface morphology of Zirconia films. The results show that the thickness of Zirconia films with one, two and three layers are about 50hm, 80hm and 100nm, respectively. As the film thickness increase, the porous structure of zirconia films change into compact and uniform granular structure, and the surface roughness of Zirconia films also decrease.