对提高HgCdTe小片光刻图形分辨率的讨论

The Methods of Improving the Photo-Lithograph Resolution on HgCdTe Small Chip

在HgCdTe焦平面器件制备过程中 ,由于受材料尺寸的限制 ,使得光刻图形的分辨率大大降低。改变涂胶条件和采用投影式曝光方式 ,可改善HgCdTe小片光刻图形的分辨率。

In the process of making MCT FPA, the small size MCT material will influence the Resolution of photo lithograph. The improved methods of the photo lithograph fitted to MCT small chip were discussed.