银系红外低辐射膜的结构与光学性能分析

STRUCTURE AND OPTICAL PROPERTY OF SILVER-BASED INFRARED LOW EMITTANCE FILMS

采用直流磁控溅射法在玻璃基底上镀制了银系红外低辐射薄膜,实验结果表明,设计良好的多层薄膜在远红外区比单层银膜具有更好的反射性能,所制备薄膜的可见光透过率已达80%以上、远红外波段辐射率已降至0.11。用原子力显微镜(AFM)观测的结果表明,溅射在TiO2和NiCr膜上的厚约10nm的银层形成连续均匀的薄膜结构,而单层银膜在这样的厚度下一般以不连续的孤岛状形式存在;同时通过对样品的AFM形貌进行分析,得到该复合膜系表面的粗糙度有效值为1.03nm,可显著降低薄膜的光学吸收和光学散射作用,从而也有利于提高薄膜的可见光透射率和远红外反射率。

The silver-based infrared low emittance films have been deposited onto glass substrates by DC magnetron sputtering. The experimental results show that a well-designed multi-layer coating is better than single-layer silver coating for reflectivity property in the far infrared region, its transmittance has reached more than 80% and emit- tanee in far infrared region has dropped to 0.11. It has been observed that from the AFM measurement, a 10nm thick silver layer can form the homogeneous grains in size when it is deposited onto the Ni-Cr and TiO2 layer, but the single silver film in such thickness usually is in a discontinuous solitary island form; and AFM measurement shows that RMS of the multi-layer coating is 1.03nm, which can significantly reduce the optical absorption and op- tical scattering, and thus maximize both the visible transmittance and the IR reflectance.