磁场-微波等离子体与大面积金刚石薄膜

MAGNETIC FIELD ASSISTED MICROWAVE PLASMA AND LARGE AREA DIAMOND FILM DEPOSITION

在磁场辅助下电子回旋共振(ECR)效应在大的空间范围形成高密度的等离子体,为大面积金刚石薄膜的淀积提供有利条件,以CH_4-H_2为原料气体,在Si基片上,在比其他制备方法更低的压强(3Torr附近)下已制备出直径约为5cm的金刚石薄膜,从空间等离子体范围来看且有可能达更大的面积,在分析等离子体发射光谱的基础上,对0.5到50Torr压强的金刚石气相生长条件作了讨论。

Under the assistance of magnetic field, the electron cyclotron resonance effect generates a high density plasma in a large spaceregion This offers an beneficial condition for large area diamond films deposition. By using a mixture of methane (CH4) and hydrogen (H2), a diamond film of 5 cm diameter has been grown on silicon substrate under the pressure about 3 Torr which is considerably lower than the pressure in all other methods recently used. In view of the spacial extent of the plasma, we see that it is possible to further increase the area of deposited diamond film. The growth condition of diamond film in gas phase deposition under the pressure of 0.5 to 50 Torr has been discussed on the basis of analyzing the optical emission spectrum of the plasma.